Nanocrystalline silicon thin films by RF plasma enhanced chemical vapour deposition

Nanocrystalline silicon thin films by RF plasma enhanced chemical vapour deposition

A plasma enhanced chemical vapour deposition (PECVD) system was designed and built in-house for the deposition of nanocrystalline silicon thin films. In this work, nanocrystalline slicon thin films were deposited at different rf(radio-frequency) power with the silane to hydrogen partial pressure rat...

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Bibliographic Details
Main Authors:	Han, S.C., Tong, G.B., Richard, R., Meriam Ab, G.S., Rasat, M.M., Rahman, S.A.
Format:	Article
Published:	2006
Subjects:	QC Physics
Online Access:	http://eprints.um.edu.my/7365/

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