Multi-phase structured hydrogenated amorphous silicon carbon nitride thin films grown by plasma enhanced chemical vapour deposition
In this work, hydrogenated amorphous silicon carbon nitride (a-SiCN:H) films were grown by plasma-enhanced chemical vapour deposition (PECVD) process using SiH4, CH4 and N2 gas discharge. The effects of N2 flow-rate on the structure, optical as well as photoluminescence properties were investigated....
| Main Authors: | , , , , , , , |
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| Format: | Article |
| Published: |
Elsevier
2017
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| Subjects: | |
| Online Access: | https://doi.org/10.1016/j.jallcom.2017.05.289 https://doi.org/10.1016/j.jallcom.2017.05.289 |