Post-annealing effects on ITO thin films RF sputtered at different thicknesses on Si and glass
We report on electrical, optical and surface morphological characteristics of indium tin oxide (ITO) thin films. The ITO was deposited by radio frequency (RF) magnetron sputtering on Si and glass substrates at different thicknesses of 125 nm and 239 nm. Post-annealing treatment was conducted on the...
| Main Authors: | , , , |
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| Format: | Article |
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Trans Tech Publications
2014
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| Online Access: | doi:10.4028/www.scientific.net/AMR.925.411 doi:10.4028/www.scientific.net/AMR.925.411 |