Han, S., Tong, G., Richard, R., Meriam Ab, G., Rasat, M., & Rahman, S. (2006). Nanocrystalline silicon thin films by RF plasma enhanced chemical vapour deposition.
Chicago Style CitationHan, S.C., G.B Tong, R. Richard, G.S Meriam Ab, M.M Rasat, and S.A Rahman. Nanocrystalline Silicon Thin Films By RF Plasma Enhanced Chemical Vapour Deposition. 2006.
MLA CitationHan, S.C., et al. Nanocrystalline Silicon Thin Films By RF Plasma Enhanced Chemical Vapour Deposition. 2006.
Warning: These citations may not always be 100% accurate.