Characterization and density control of GaN nanodots on Si (111) by droplet epitaxy using plasma-assisted molecular beam epitaxy
In this report, self-organized GaN nanodots have been grown on Si (111) by droplet epitaxy method, and their density can be controlled from 1.1 × 1010 to 1.1 × 1011 cm-2 by various growth parameters, such as substrate temperatures for Ga droplet formation, the pre-nitridation treatment of Si substra...
| Main Authors: | , , , , , |
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| Format: | Online |
| Language: | English |
| Published: |
Springer
2014
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| Online Access: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4275119/ |