Critical aspects of substrate nanopatterning for the ordered growth of GaN nanocolumns

Precise and reproducible surface nanopatterning is the key for a successful ordered growth of GaN nanocolumns. In this work, we point out the main technological issues related to the patterning process, mainly surface roughness and cleaning, and mask adhesion to the substrate. We found that each of...

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Main Authors:	Barbagini, Francesca, Bengoechea-Encabo, Ana, Albert, Steven, Martinez, Javier, Sanchez García, Miguel Angel, Trampert, Achim, Calleja, Enrique
Format:	Online
Language:	English
Published:	Springer 2011
Online Access:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3264675/

id	pubmed-3264675
recordtype	oai_dc
spelling	pubmed-32646752012-01-24 Critical aspects of substrate nanopatterning for the ordered growth of GaN nanocolumns Barbagini, Francesca Bengoechea-Encabo, Ana Albert, Steven Martinez, Javier Sanchez García, Miguel Angel Trampert, Achim Calleja, Enrique Nano Express Precise and reproducible surface nanopatterning is the key for a successful ordered growth of GaN nanocolumns. In this work, we point out the main technological issues related to the patterning process, mainly surface roughness and cleaning, and mask adhesion to the substrate. We found that each of these factors, process-related, has a dramatic impact on the subsequent selective growth of the columns inside the patterned holes. We compare the performance of e-beam lithography, colloidal lithography, and focused ion beam in the fabrication of hole-patterned masks for ordered columnar growth. These results are applicable to the ordered growth of nanocolumns of different materials. Springer 2011-12-14 /pmc/articles/PMC3264675/ /pubmed/22168918 http://dx.doi.org/10.1186/1556-276X-6-632 Text en Copyright ©2011 Barbagini et al; licensee Springer. http://creativecommons.org/licenses/by/2.0 This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
repository_type	Open Access Journal
institution_category	Foreign Institution
institution	US National Center for Biotechnology Information
building	NCBI PubMed
collection	Online Access
language	English
format	Online
author	Barbagini, Francesca Bengoechea-Encabo, Ana Albert, Steven Martinez, Javier Sanchez García, Miguel Angel Trampert, Achim Calleja, Enrique
spellingShingle	Barbagini, Francesca Bengoechea-Encabo, Ana Albert, Steven Martinez, Javier Sanchez García, Miguel Angel Trampert, Achim Calleja, Enrique Critical aspects of substrate nanopatterning for the ordered growth of GaN nanocolumns
author_facet	Barbagini, Francesca Bengoechea-Encabo, Ana Albert, Steven Martinez, Javier Sanchez García, Miguel Angel Trampert, Achim Calleja, Enrique
author_sort	Barbagini, Francesca
title	Critical aspects of substrate nanopatterning for the ordered growth of GaN nanocolumns
title_short	Critical aspects of substrate nanopatterning for the ordered growth of GaN nanocolumns
title_full	Critical aspects of substrate nanopatterning for the ordered growth of GaN nanocolumns
title_fullStr	Critical aspects of substrate nanopatterning for the ordered growth of GaN nanocolumns
title_full_unstemmed	Critical aspects of substrate nanopatterning for the ordered growth of GaN nanocolumns
title_sort	critical aspects of substrate nanopatterning for the ordered growth of gan nanocolumns
description	Precise and reproducible surface nanopatterning is the key for a successful ordered growth of GaN nanocolumns. In this work, we point out the main technological issues related to the patterning process, mainly surface roughness and cleaning, and mask adhesion to the substrate. We found that each of these factors, process-related, has a dramatic impact on the subsequent selective growth of the columns inside the patterned holes. We compare the performance of e-beam lithography, colloidal lithography, and focused ion beam in the fabrication of hole-patterned masks for ordered columnar growth. These results are applicable to the ordered growth of nanocolumns of different materials.
publisher	Springer
publishDate	2011
url	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3264675/
_version_	1611501834848960512

Critical aspects of substrate nanopatterning for the ordered growth of GaN nanocolumns

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