Phonon deformation potentials of hexagonal GaN studied by biaxial stress modulation

In this work, a biaxial stress modulation method, combining the microfabrication technique, finite element analysis and a weighted averaging process, was developed to study piezospectroscopic behavior of hexagonal GaN films, epitaxially grown by metalorganic chemical vapor deposition on c-sapphire a...

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Bibliographic Details
Main Authors: Jun-Yong Lu, Dong-Mei Deng, Yong Wang, Kevin Jing Chen, Kei-May Lau, Tong-Yi Zhang
Format: Article
Language:English
Published: AIP Publishing LLC 2011-09-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.3626532
Description
Summary:In this work, a biaxial stress modulation method, combining the microfabrication technique, finite element analysis and a weighted averaging process, was developed to study piezospectroscopic behavior of hexagonal GaN films, epitaxially grown by metalorganic chemical vapor deposition on c-sapphire and Si (111) substrates. Adjusting the size of patterned islands, various biaxial stress states could be obtained at the island centers, leading to abundant stress-Raman shift data. With the proposed stress modulation method, the Raman biaxial stress coefficients of E2H and A1 (LO) phonons of GaN were determined to be 3.43 cm-1/GPa and 2.34 cm-1/GPa, respectively.
ISSN:2158-3226