Investigation into the influence of direct current (DC) power in the magnetron sputtering process on the copper crystallite size

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Investigation into the influence of direct current (DC) power in the magnetron sputtering process on the copper crystallite size

This paper discusses the influence of direct current (DC) power in the magnetron sputtering process on the crystallite size of the copper (Cu) thin films deposited on p-type silicon substrate at room temperature. X-ray diffraction (XRD) and Karl Suss four-point probe were employed to study the film...

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Bibliographic Details
Main Authors:	CHAN, K, TEO, B
Format:	Article
Language:	English
Published:	ELSEVIER SCI LTD 2007
Subjects:	T Technology (General) QA75.5-76.95 Electronic computers. Computer science
Online Access:	http://shdl.mmu.edu.my/3138/ http://shdl.mmu.edu.my/3138/1/1152.pdf

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