Investigation into the influence of direct current (DC) power in the magnetron sputtering process on the copper crystallite size
This paper discusses the influence of direct current (DC) power in the magnetron sputtering process on the crystallite size of the copper (Cu) thin films deposited on p-type silicon substrate at room temperature. X-ray diffraction (XRD) and Karl Suss four-point probe were employed to study the film...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
ELSEVIER SCI LTD
2007
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| Subjects: | |
| Online Access: | http://shdl.mmu.edu.my/3138/ http://shdl.mmu.edu.my/3138/1/1152.pdf |