Characterization of TiAlBN nanocomposite coating deposited via radio frequency magnetron sputtering using single hot-pressed target
TiAlBN coatings have been deposited at varying bias voltage of 0, -60, and -150 V by radio frequency (RF) magnetron sputtering technique. A single hot-pressed Ti-Al-BN target was used for the deposition process. With glancing angle X-ray diffraction analysis (GAXRD), the nanocrystalline (nc-) (Ti,Al...
| Main Authors: | , , , , , |
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| Format: | Conference or Workshop Item |
| Published: |
2012
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| Subjects: | |
| Online Access: | http://eprints.uthm.edu.my/3483/ http://eprints.uthm.edu.my/3483/1/Characterization_of_TiAlBN_Nanocomposite_Coating_deposited_via.pdf |
| Summary: | TiAlBN coatings have been deposited at varying bias voltage of 0, -60, and -150 V by
radio frequency (RF) magnetron sputtering technique. A single hot-pressed Ti-Al-BN target was
used for the deposition process. With glancing angle X-ray diffraction analysis (GAXRD), the
nanocrystalline (nc-) (Ti,Al)N phase was identified. In addition, the existence of BN and TiB2
amorphous (a-) phase were detected by X-ray photoelectron spectroscopy (XPS) analysis. Thus, the
deposited TiAlBN coatings were confirmed as nc-(Ti,Al)N/a-BN/a-TiB2 nanocomposite. On the
other hand, it was found that optimum bias voltage used in present study is -60 V where the
deposited TiAlBN coating exhibits an excellent adhesion quality. The adhesion quality of the
coatings deposited at -60V bias voltage is classified as HF 1 evaluated using the Rockwell-C
adhesion test method (developed by the Union of German Engineers). |
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