The characterization of KrF photoresists and the effect of different chromophore bulkiness on line edge roughness (LER) for submicron technology
This research characterizes line edge roughness (LER), determines which resist has lowest LER for all process variations, and investigates the effect of chromophore bulkiness on LER. Three KrF photoresists with different chromophore bulkiness were evaluated. The characteristics evaluated were depth...
| Main Authors: | , , , , |
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| Published: |
2017
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| Online Access: | http://dspace.uniten.edu.my:8080/jspui/handle/123456789/5312 |