A Novel Self-aligned and Maskless Process for Formation of Highly Uniform Arrays of Nanoholes and Nanopillars

Fabrication of a large area of periodic structures with deep sub-wavelength features is required in many applications such as solar cells, photonic crystals, and artificial kidneys. We present a low-cost and high-throughput process for realization of 2D arrays of deep sub-wavelength features using a...

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Main Authors:	Wu, Wei, Dey, Dibyendu, Memis, Omer G, Katsnelson, Alex, Mohseni, Hooman
Format:	Online
Language:	English
Published:	Springer 2008
Online Access:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3244793/

id	pubmed-3244793
recordtype	oai_dc
spelling	pubmed-32447932011-12-29 A Novel Self-aligned and Maskless Process for Formation of Highly Uniform Arrays of Nanoholes and Nanopillars Wu, Wei Dey, Dibyendu Memis, Omer G Katsnelson, Alex Mohseni, Hooman Nano Express Fabrication of a large area of periodic structures with deep sub-wavelength features is required in many applications such as solar cells, photonic crystals, and artificial kidneys. We present a low-cost and high-throughput process for realization of 2D arrays of deep sub-wavelength features using a self-assembled monolayer of hexagonally close packed (HCP) silica and polystyrene microspheres. This method utilizes the microspheres as super-lenses to fabricate nanohole and pillar arrays over large areas on conventional positive and negative photoresist, and with a high aspect ratio. The period and diameter of the holes and pillars formed with this technique can be controlled precisely and independently. We demonstrate that the method can produce HCP arrays of hole of sub-250 nm size using a conventional photolithography system with a broadband UV source centered at 400 nm. We also present our 3D FDTD modeling, which shows a good agreement with the experimental results. Springer 2008-03-04 /pmc/articles/PMC3244793/ http://dx.doi.org/10.1007/s11671-008-9124-6 Text en Copyright ©2008 to the authors
repository_type	Open Access Journal
institution_category	Foreign Institution
institution	US National Center for Biotechnology Information
building	NCBI PubMed
collection	Online Access
language	English
format	Online
author	Wu, Wei Dey, Dibyendu Memis, Omer G Katsnelson, Alex Mohseni, Hooman
spellingShingle	Wu, Wei Dey, Dibyendu Memis, Omer G Katsnelson, Alex Mohseni, Hooman A Novel Self-aligned and Maskless Process for Formation of Highly Uniform Arrays of Nanoholes and Nanopillars
author_facet	Wu, Wei Dey, Dibyendu Memis, Omer G Katsnelson, Alex Mohseni, Hooman
author_sort	Wu, Wei
title	A Novel Self-aligned and Maskless Process for Formation of Highly Uniform Arrays of Nanoholes and Nanopillars
title_short	A Novel Self-aligned and Maskless Process for Formation of Highly Uniform Arrays of Nanoholes and Nanopillars
title_full	A Novel Self-aligned and Maskless Process for Formation of Highly Uniform Arrays of Nanoholes and Nanopillars
title_fullStr	A Novel Self-aligned and Maskless Process for Formation of Highly Uniform Arrays of Nanoholes and Nanopillars
title_full_unstemmed	A Novel Self-aligned and Maskless Process for Formation of Highly Uniform Arrays of Nanoholes and Nanopillars
title_sort	novel self-aligned and maskless process for formation of highly uniform arrays of nanoholes and nanopillars
description	Fabrication of a large area of periodic structures with deep sub-wavelength features is required in many applications such as solar cells, photonic crystals, and artificial kidneys. We present a low-cost and high-throughput process for realization of 2D arrays of deep sub-wavelength features using a self-assembled monolayer of hexagonally close packed (HCP) silica and polystyrene microspheres. This method utilizes the microspheres as super-lenses to fabricate nanohole and pillar arrays over large areas on conventional positive and negative photoresist, and with a high aspect ratio. The period and diameter of the holes and pillars formed with this technique can be controlled precisely and independently. We demonstrate that the method can produce HCP arrays of hole of sub-250 nm size using a conventional photolithography system with a broadband UV source centered at 400 nm. We also present our 3D FDTD modeling, which shows a good agreement with the experimental results.
publisher	Springer
publishDate	2008
url	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3244793/
_version_	1611496139709743104

A Novel Self-aligned and Maskless Process for Formation of Highly Uniform Arrays of Nanoholes and Nanopillars

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