Correlation Between the Microstructure of Copper Oxide Thin Film and Its Gas Sensing Response
Copper oxide gas sensor was prepared on silicon wafer by sputtering of copper target at different oxygen flow rate of 0, 4, 8 and 16 sccm using RF magnetron sputtering technique. Argon flow rate, RF power, working pressure and substrate bias voltage were fixed at 50 sccm, 400 W, 22.5 mTorr and −40 V...
| Main Authors: | , , , , , , |
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| Format: | Conference or Workshop Item |
| Language: | English |
| Published: |
2014
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| Subjects: | |
| Online Access: | http://umpir.ump.edu.my/id/eprint/7371/ http://umpir.ump.edu.my/id/eprint/7371/ http://umpir.ump.edu.my/id/eprint/7371/1/Correlation_between_the_microstructure_of_copper_oxide_thin_film_and_its_gas_sensing_response.pdf |