Influence of the SiNx:H layer deposited by PECVD technique on the surface and grain boundary passivation of mc-Si

Bibliographic Details
Main Authors:	Stanislawa, Kluska, Piotr, Panek
Format:	text
Language:	eng
Published:	Emerald 2016
Subjects:	Thick/thin film technology,Hydrogenated silicon nitride,Multicrystalline silicon (mc-Si),Passivation effect,PECVD

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