Stanislawa, K., & Piotr, P. (2016). Influence of the SiNx: H layer deposited by PECVD technique on the surface and grain boundary passivation of mc-Si. Emerald.
Chicago Style CitationStanislawa, Kluska, and Panek Piotr. Influence of the SiNx: H Layer Deposited By PECVD Technique On the Surface and Grain Boundary Passivation of Mc-Si. Emerald, 2016.
MLA CitationStanislawa, Kluska, and Panek Piotr. Influence of the SiNx: H Layer Deposited By PECVD Technique On the Surface and Grain Boundary Passivation of Mc-Si. Emerald, 2016.
Warning: These citations may not always be 100% accurate.