Skip to content
VuFind
All Fields
Title
Author
Subject
Call Number
ISBN/ISSN
Tag
Find
Advanced
Study of the effect of substra...
Holdings
Cite this
Export Record
Export to RefWorks
Export to EndNoteWeb
Export to EndNote
Study of the effect of substrate bias on the electrical properties of sputtered HfO2 thin film deposited on silicon substrate
Bibliographic Details
Main Authors:
R.K., Nahar
,
Aparna, Sharma
Format:
text
Language:
eng
Published:
Emerald
2007
Subjects:
Thin films,Substrates,Electrical conductivity
Holdings
Description
Similar Items
Staff View
Similar Items
DC magnetron sputter‐deposited tungsten silicide films for microelectronic applications
by: Jian‐Wei, Hoon, et al.
Published: (2011)
Thick‐film strain and temperature sensors on LTCC substrates
by: Marko, Hrovat, et al.
Published: (2006)
Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
by: Xiao-Ying Zhang, et al.
Published: (2017-05-01)
Micropositioning device for automatic alignment of substrates for industrial‐scale thin films deposition
by: A., Castañeda, et al.
Published: (2001)
Structural colors of fabric from Ag/TiO2 composite films prepared by magnetron sputtering deposition
by: Xiaohong, Yuan, et al.
Published: (2017)
×
Loading...