Advanced Ta-based diffusion barriers for Cu interconnects [

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Advanced Ta-based diffusion barriers for Cu interconnects [

Bibliographic Details
Main Author:	Heubner, Renae (Author)
Format:	Book
Language:	English
Published:	New York : Nova Science Publishers , c2009
Subjects:	Electrodiffusion Integrated circuits Interconnects (Integrated circuit technology)
Online Access:	NetLibrary

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