Advanced Ta-based diffusion barriers for Cu interconnects [

Advanced Ta-based diffusion barriers for Cu interconnects [

Bibliographic Details
Main Author: Heubner, Renae (Author)
Format: Book
Language:English
Published: New York : Nova Science Publishers , c2009
Subjects:
Electrodiffusion
Integrated circuits
Interconnects (Integrated circuit technology)
Online Access:NetLibrary

Internet

NetLibrary

Badak Internet Collection

Holdings details from Badak Internet Collection
Call Number: TK7874 53 H83 2009
Accession Item Category Format Status Notes
1000137141 OPEN SHELF (30 DAYS) Electronic Resource Available

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