Advanced Ta-based diffusion barriers for Cu interconnects [

Advanced Ta-based diffusion barriers for Cu interconnects [

Bibliographic Details
Main Author: Heubner, Renae (Author)
Format: Book
Language:English
Published: New York : Nova Science Publishers , c2009
Subjects:
Electrodiffusion
Integrated circuits
Interconnects (Integrated circuit technology)
Online Access:NetLibrary
Description
Item Description:Description based on print version record
Physical Description:1 online resource (93 p.) : ill
Bibliography:Includes bibliographical references (p [73]-86) and index
ISBN:1607416751 (electronic bk.)
9781604564518
9781607416753 (electronic bk.)

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