Chemical vapor depossition of tungsten and tungsten silicides for VLSI/ULSI applications / by John E. J. Schmitz

Bibliographic Details
Main Author: Schmitz, John E. J. (Author)
Format: Book
Published: Park Ridge, N. J. Noyes Publications c1992
Subjects:

MARC

LEADER 00000cam a2200000 7i4500
001 0000026151
008 021119n
020 |a 0815512880 
090 0 0 |a TK7871.15.T85  |b S36 1991 
100 0 |a Schmitz, John E. J.  |e author 
245 0 0 |a Chemical vapor depossition of tungsten and tungsten silicides for VLSI/ULSI applications / by John E. J. Schmitz 
260 2 |a Park Ridge, N. J.   |b Noyes Publications  |c c1992 
300 |a xvi, 235 p. ;  |c 25 cm. 
650 0 |a Integrated circuits  |x Very large scale integration  |x Materials 
650 0 |a Tungsten 
650 0 |a Vapor-planting 
999 |a 1000043135  |b Book  |c OPEN SHELF (30 DAYS)  |e Gong Badak Campus