Chemical vapor depossition of tungsten and tungsten silicides for VLSI/ULSI applications / by John E. J. Schmitz

Bibliographic Details
Main Author: Schmitz, John E. J. (Author)
Format: Book
Published: Park Ridge, N. J. : Noyes Publications , c1992
Subjects:

MARC

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020 |a 0815512880 
090 0 0 |a TK7871.15.T85   |b S36 1991 
100 0 |a Schmitz, John E. J. ,   |e author 
245 0 0 |a Chemical vapor depossition of tungsten and tungsten silicides for VLSI/ULSI applications / by John E. J. Schmitz 
260 2 |a Park Ridge, N. J. :   |b Noyes Publications ,   |c c1992 
300 |a xvi, 235 p. ; ;   |c 25 cm. 
504 |a Includes bibliographical references and index 
650 0 |a Integrated circuits   |x Very large scale integration   |x Materials 
650 0 |a Tungsten 
650 0 |a Vapor-planting 
999 |a 1000043135   |b Book   |c OPEN SHELF (30 DAYS)   |e Gong Badak Campus