Kesan Peningkatan Suhu Terhadap Pembentukan Titanium Silisida

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Kesan Peningkatan Suhu Terhadap Pembentukan Titanium Silisida

Penyelidikan ini bertujuan untuk mengkaji kesan suhu ke atas lapisan titanium silisida (TiSi2) yang ditumbuhkan ke atas wafer silikon. Penyelidikan ini dijalankan untuk meneliti kesan peningkatan suhu terhadap pembentukan titanium silisida. Penyelidikan ini bertujuan untuk membuat perbandingan...

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Bibliographic Details
Main Author:	Balakrishnan, Prakash Babu
Format:	Monograph
Language:	English
Published:	Universiti Sains Malaysia 2005
Subjects:	T Technology TN Mining Engineering. Metallurgy
Online Access:	http://eprints.usm.my/57572/ http://eprints.usm.my/57572/1/Kesan%20Peningkatan%20Suhu%20Terhadap%20Pembentukan%20Titanium%20Silisida_Prakash%20Babu%20Balakrishnan.pdf

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