Development Of Micro Heating Element By Optical Lithography On Alumina Substrate
Optical lithography has been used to deposit resist coatings with desired pattern on flat substrate typically silicon wafer. Yet, rather little attention has been given to the development of Fe-Cr-Al alloys on alumina substrate. Thus, a particular interest has been given to the study of Fe-Cr-Al...
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| Format: | Monograph |
| Language: | English |
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Universiti Sains Malaysia
2017
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| Online Access: | http://eprints.usm.my/53556/ http://eprints.usm.my/53556/1/Development%20Of%20Micro%20Heating%20Element%20By%20Optical%20Lithography%20On%20Alumina%20Substrate_Tan%20Teong%20Sheng_M4_2017.pdf |
| Summary: | Optical lithography has been used to deposit resist coatings with desired pattern on flat
substrate typically silicon wafer. Yet, rather little attention has been given to the
development of Fe-Cr-Al alloys on alumina substrate. Thus, a particular interest has
been given to the study of Fe-Cr-Al alloys deposition on alumina substrate as micro
heating element of low temperature range thermionic energy converter. The features of
micro heating element were printed on alumina substrate to form a SU-8 resist mask by
optical lithography method. Micro heating element of Fe-Cr-Al alloy obtained by
stripping the SU-8 resist after thermal evaporation, have been studied and measured by
SEM. The resist on alumina substrate were not stripped completely even using NMP
solvent as the lift-off solvent. The surface irregularities and porosity of as-sintered
alumina has caused the resist to diffuse into the pores and adhere strongly to the alumina
surface. The resist remains on the surface of alumina substrate even after ultrasonic
agitation was used to energies the stripping process. The feature dimension of micro
heating element on alumina substrate deviate from the desired dimension due to surface
irregularities which leads to pattern deviation. |
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