Reactive Sputtering Growth Of Indium Nitride Thin Films On Flexible Substrate Under Different Substrate Temperatures

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Reactive Sputtering Growth Of Indium Nitride Thin Films On Flexible Substrate Under Different Substrate Temperatures

Indium nitride (InN) thin films were deposited on kapton polyimide substrate by using reactive gas-timing radio frequency (RF) sputtering technique. An indium target with purity of 99.999% was used. Throughout this work, the RF power and gas ratio of argon and nitrogen were maintained at 60 W and 40...

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Bibliographic Details
Main Authors:	Osman, S. A., Ng, S. S., Hassan, Z.
Format:	Conference or Workshop Item
Language:	English
Published:	2019
Subjects:	QC1-999 Physics
Online Access:	http://eprints.usm.my/48847/ http://eprints.usm.my/48847/1/ICoSeMT%202019%20ABSTRACT%20BOOK%20117.pdf

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