Reactive Sputtering Growth Of Indium Nitride Thin Films On Flexible Substrate Under Different Substrate Temperatures
Indium nitride (InN) thin films were deposited on kapton polyimide substrate by using reactive gas-timing radio frequency (RF) sputtering technique. An indium target with purity of 99.999% was used. Throughout this work, the RF power and gas ratio of argon and nitrogen were maintained at 60 W and 40...
| Main Authors: | , , |
|---|---|
| Format: | Conference or Workshop Item |
| Language: | English |
| Published: |
2019
|
| Subjects: | |
| Online Access: | http://eprints.usm.my/48847/ http://eprints.usm.my/48847/1/ICoSeMT%202019%20ABSTRACT%20BOOK%20117.pdf |