On the fabrication of aluminum doped silica preform using MCVD and solution doping technique

On the fabrication of aluminum doped silica preform using MCVD and solution doping technique

This paper provides detailed discussions on the fabrication of aluminum doped silica preform using solution doping technique and modified chemical vapor deposition (MCVD). The porous core layer was deposited at 1750°C with 30cm in deposition length. The soot formed at the inlet and outlet segment of...

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Bibliographic Details
Main Authors: Aljamimi, Salah Mohammed, Mat Sharif, Khairul Anuar, Muhamad Yassin, Shahrin Zen, Zulkifli, Mohd Imran, Tamchek, Nizam, Yusoff, Zulfadzli, Abdul Rashid, Hairul Azhar
Format: Conference or Workshop Item
Language:English
Published: IEEE 2012
Online Access:http://psasir.upm.edu.my/id/eprint/69505/
http://psasir.upm.edu.my/id/eprint/69505/1/On%20the%20fabrication%20of%20aluminum%20doped%20silica%20preform%20using%20MCVD%20and%20solution%20doping%20technique.pdf

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