Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system
The photo-polishing of POME over UV /'ZnO photocatalysis system was performed in current study. The ZnO material, with band gap energy of 3.2 eV from our UV-Vis DRS measurement, was proven responsive towards 100 W UV-irradiation of 365 nm wavelength. The effect of ZnO loading was investigated B...
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| Format: | Conference or Workshop Item |
| Language: | English |
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2016
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| Online Access: | http://umpir.ump.edu.my/id/eprint/17069/ http://umpir.ump.edu.my/id/eprint/17069/1/Photo-polishing%20of%20Palm%20Oil%20Mill%20Effluent%20%28POME%29%20over%20UVZnO%20System.pdf |
| _version_ | 1848820338115215360 |
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| author | Ng, K. H. Cheng, C. K. |
| author_facet | Ng, K. H. Cheng, C. K. |
| author_sort | Ng, K. H. |
| building | UMP Institutional Repository |
| collection | Online Access |
| description | The photo-polishing of POME over UV /'ZnO photocatalysis system was performed in current study. The ZnO material, with band gap energy of 3.2 eV from our UV-Vis DRS measurement, was proven responsive towards 100 W UV-irradiation of 365 nm wavelength. The effect of ZnO loading was investigated Based on the results obtained, the optimum ZnO loading for POME photomineralization was 1.0 g/L, with about 50% of COD removal recorded after 240 min of UV irradiation. It is found that all the photomineralization kinetics for all the photoreaction followed the 1st-order reaction with specific reaction rates (k) ranging froml.022 x10-3 to 3.118 x10-3 min-1 • Significantly, the organic removal efficiency was further enhanced when UV exposure was prolonged to 22 h, attaining final readings of 44 ppm of chemical oxygen demand (COD) level. |
| first_indexed | 2025-11-15T02:07:52Z |
| format | Conference or Workshop Item |
| id | ump-17069 |
| institution | Universiti Malaysia Pahang |
| institution_category | Local University |
| language | English |
| last_indexed | 2025-11-15T02:07:52Z |
| publishDate | 2016 |
| recordtype | eprints |
| repository_type | Digital Repository |
| spelling | ump-170692018-06-29T02:10:06Z http://umpir.ump.edu.my/id/eprint/17069/ Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system Ng, K. H. Cheng, C. K. TP Chemical technology The photo-polishing of POME over UV /'ZnO photocatalysis system was performed in current study. The ZnO material, with band gap energy of 3.2 eV from our UV-Vis DRS measurement, was proven responsive towards 100 W UV-irradiation of 365 nm wavelength. The effect of ZnO loading was investigated Based on the results obtained, the optimum ZnO loading for POME photomineralization was 1.0 g/L, with about 50% of COD removal recorded after 240 min of UV irradiation. It is found that all the photomineralization kinetics for all the photoreaction followed the 1st-order reaction with specific reaction rates (k) ranging froml.022 x10-3 to 3.118 x10-3 min-1 • Significantly, the organic removal efficiency was further enhanced when UV exposure was prolonged to 22 h, attaining final readings of 44 ppm of chemical oxygen demand (COD) level. 2016 Conference or Workshop Item NonPeerReviewed pdf en http://umpir.ump.edu.my/id/eprint/17069/1/Photo-polishing%20of%20Palm%20Oil%20Mill%20Effluent%20%28POME%29%20over%20UVZnO%20System.pdf Ng, K. H. and Cheng, C. K. (2016) Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system. In: International Conference on Catalysis 2016 (ICAT 2016) , 20-21 September 2016 , Grand Bluewave Hotel, Johor Bahru. p. 1.. (Unpublished) (Unpublished) |
| spellingShingle | TP Chemical technology Ng, K. H. Cheng, C. K. Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system |
| title | Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system |
| title_full | Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system |
| title_fullStr | Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system |
| title_full_unstemmed | Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system |
| title_short | Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system |
| title_sort | photo-polishing of palm oil mill effluent (pome) over uv/zno system |
| topic | TP Chemical technology |
| url | http://umpir.ump.edu.my/id/eprint/17069/ http://umpir.ump.edu.my/id/eprint/17069/1/Photo-polishing%20of%20Palm%20Oil%20Mill%20Effluent%20%28POME%29%20over%20UVZnO%20System.pdf |