Characterization of pMosfet degradation in negative bias temperature instability test / Soon Foo Yew

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Characterization of pMosfet degradation in negative bias temperature instability test / Soon Foo Yew

Threshold voltage instability has become a major IC reliability concern for sub-micron CMOS process technology. In the past, VTH Stability test is commonly used by the wafer fabrication plant to have a quick assessment on this reliability concern during process qualification, due to its simple te...

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Bibliographic Details
Main Author:	Soon, Foo Yew
Format:	Thesis
Published:	2012
Subjects:	T Technology (General) TA Engineering (General). Civil engineering (General)
Online Access:	http://studentsrepo.um.edu.my/8383/ http://studentsrepo.um.edu.my/8383/6/Dissertation%2DNBTI%2DFinal.pdf

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