Characterization of pMosfet degradation in negative bias temperature instability test / Soon Foo Yew
Threshold voltage instability has become a major IC reliability concern for sub-micron CMOS process technology. In the past, VTH Stability test is commonly used by the wafer fabrication plant to have a quick assessment on this reliability concern during process qualification, due to its simple te...
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| Format: | Thesis |
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2012
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| Online Access: | http://studentsrepo.um.edu.my/8383/ http://studentsrepo.um.edu.my/8383/6/Dissertation%2DNBTI%2DFinal.pdf |