Cheng, T. S., Summerfield, A., Mellor, C. J., Khlobystov, A. N., Eaves, L., Foxon, C. T., . . . Novikov, S. V. (2018). High-temperature molecular beam epitaxy of hexagonal boron nitride with high active nitrogen fluxes. MDPI.
Chicago Style (17th ed.) CitationCheng, Tin S., Alex Summerfield, Christopher J. Mellor, Andrei N. Khlobystov, Laurence Eaves, C. Thomas Foxon, Peter H. Beton, and Sergei V. Novikov. High-temperature Molecular Beam Epitaxy of Hexagonal Boron Nitride with High Active Nitrogen Fluxes. MDPI, 2018.
MLA (9th ed.) CitationCheng, Tin S., et al. High-temperature Molecular Beam Epitaxy of Hexagonal Boron Nitride with High Active Nitrogen Fluxes. MDPI, 2018.
Warning: These citations may not always be 100% accurate.