Stress-dependent local oxidation of silicon

The two-dimensional isolation oxidation of silicon is considered for stress-dependent reaction and diffusion coefficients. The influence of such parameters is investigated numerically and asymptotically in the bird's beak problem and for curved geometries arising in the oxidation of cylindrical...

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Main Authors: Evans, J.D., King, J.R.
Format: Article
Published: Society for Industrial and Applied Mathematics 2017
Online Access:https://eprints.nottingham.ac.uk/50646/
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author Evans, J.D.
King, J.R.
author_facet Evans, J.D.
King, J.R.
author_sort Evans, J.D.
building Nottingham Research Data Repository
collection Online Access
description The two-dimensional isolation oxidation of silicon is considered for stress-dependent reaction and diffusion coefficients. The influence of such parameters is investigated numerically and asymptotically in the bird's beak problem and for curved geometries arising in the oxidation of cylindrical and spherical structures. In the bird's beak problem, the limit of large activation volume is described for a stress-dependent reaction coefficient, illustrating the significant growth retardation of the silicon/silicon oxide interface and reduced stresses in the silicon oxide. Novel high-order nonlinear evolution-type PDEs are derived and investigated using asymptotic and numerical techniques.
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spelling nottingham-506462020-05-04T19:20:12Z https://eprints.nottingham.ac.uk/50646/ Stress-dependent local oxidation of silicon Evans, J.D. King, J.R. The two-dimensional isolation oxidation of silicon is considered for stress-dependent reaction and diffusion coefficients. The influence of such parameters is investigated numerically and asymptotically in the bird's beak problem and for curved geometries arising in the oxidation of cylindrical and spherical structures. In the bird's beak problem, the limit of large activation volume is described for a stress-dependent reaction coefficient, illustrating the significant growth retardation of the silicon/silicon oxide interface and reduced stresses in the silicon oxide. Novel high-order nonlinear evolution-type PDEs are derived and investigated using asymptotic and numerical techniques. Society for Industrial and Applied Mathematics 2017-12-02 Article PeerReviewed Evans, J.D. and King, J.R. (2017) Stress-dependent local oxidation of silicon. SIAM Journal on Applied Mathematics, 77 (6). pp. 2012-2039. ISSN 0036-1399 https://epubs.siam.org/doi/10.1137/16M1060613 doi:10.1137/16M1060613 doi:10.1137/16M1060613
spellingShingle Evans, J.D.
King, J.R.
Stress-dependent local oxidation of silicon
title Stress-dependent local oxidation of silicon
title_full Stress-dependent local oxidation of silicon
title_fullStr Stress-dependent local oxidation of silicon
title_full_unstemmed Stress-dependent local oxidation of silicon
title_short Stress-dependent local oxidation of silicon
title_sort stress-dependent local oxidation of silicon
url https://eprints.nottingham.ac.uk/50646/
https://eprints.nottingham.ac.uk/50646/
https://eprints.nottingham.ac.uk/50646/