A microscopy approach for in situ inspection of the μCMM stylus for contamination

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A microscopy approach for in situ inspection of the μCMM stylus for contamination

During the µCMM measurement process, contamination gradually builds up on the surface of the stylus tip and affects dimensional accuracy of the measurement. Regular inspection of the stylus for contamination is essential in determining the appropriate cleaning interval and preventing the dimensional...

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Bibliographic Details
Main Authors:	Feng, Xiaobing, Pascal, Jonathan, Lawes, Simon
Format:	Article
Published:	IOP Publishing 2017
Subjects:	μCMM stylus inspection contamination microscopy focus stacking
Online Access:	https://eprints.nottingham.ac.uk/44056/

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