Effect of lithographically-induced strain relaxation on the magnetic domain configuration in microfabricated epitaxially grown Fe81Ga19

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Effect of lithographically-induced strain relaxation on the magnetic domain configuration in microfabricated epitaxially grown Fe81Ga19

We investigate the role of lithographically-induced strain relaxation in a micron-scaled device fabricated from epitaxial thin films of the magnetostrictive alloy Fe81Ga19. The strain relaxation due to lithographic patterning induces a magnetic anisotropy that competes with the magnetocrystalline an...

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Bibliographic Details
Main Authors:	Beardsley, R.P., Parkes, D.E., Zemen, J., Bowe, S., Edmonds, K.W., Reardon, C., Maccherozzi, F., Isakov, I., Warburton, P.A., Campion, R.P., Gallagher, B.L., Cavill, S.A., Rushforth, A.W.
Format:	Article
Published:	Nature Publishing Group 2017
Online Access:	https://eprints.nottingham.ac.uk/40144/

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