Effect of lithographically-induced strain relaxation on the magnetic domain configuration in microfabricated epitaxially grown Fe81Ga19
We investigate the role of lithographically-induced strain relaxation in a micron-scaled device fabricated from epitaxial thin films of the magnetostrictive alloy Fe81Ga19. The strain relaxation due to lithographic patterning induces a magnetic anisotropy that competes with the magnetocrystalline an...
| Main Authors: | , , , , , , , , , , , , |
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| Format: | Article |
| Published: |
Nature Publishing Group
2017
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| Online Access: | https://eprints.nottingham.ac.uk/40144/ |