CHAN, K., & TEO, B. (2007). Investigation into the influence of direct current (DC) power in the magnetron sputtering process on the copper crystallite size. ELSEVIER SCI LTD.
Chicago Style (17th ed.) CitationCHAN, K., and B. TEO. Investigation into the Influence of Direct Current (DC) Power in the Magnetron Sputtering Process on the Copper Crystallite Size. ELSEVIER SCI LTD, 2007.
MLA (9th ed.) CitationCHAN, K., and B. TEO. Investigation into the Influence of Direct Current (DC) Power in the Magnetron Sputtering Process on the Copper Crystallite Size. ELSEVIER SCI LTD, 2007.
Warning: These citations may not always be 100% accurate.