APA (7th ed.) Citation

Chan, K., & Teo, B. (2007). Effect of Ar pressure on grain size of magnetron sputter-deposited Cu thin films. INST ENGINEERING TECHNOLOGY-IET.

Chicago Style (17th ed.) Citation

Chan, K.Y, and B.S Teo. Effect of Ar Pressure on Grain Size of Magnetron Sputter-deposited Cu Thin Films. INST ENGINEERING TECHNOLOGY-IET, 2007.

MLA (9th ed.) Citation

Chan, K.Y, and B.S Teo. Effect of Ar Pressure on Grain Size of Magnetron Sputter-deposited Cu Thin Films. INST ENGINEERING TECHNOLOGY-IET, 2007.

Warning: These citations may not always be 100% accurate.