Sputtering power and deposition pressure effects on the electrical and structural properties of copper thin films

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Sputtering power and deposition pressure effects on the electrical and structural properties of copper thin films

We investigated the effects of sputtering power and deposition pressure on the electrical and structural properties of dc magnetron sputter-deposited copper films on p-type silicon grown at room temperature. Results from our experiments showed that the deposition rate of the copper films increased p...

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Bibliographic Details
Main Authors:	Chan, Kah-Yoong, Teo, Bee-San
Format:	Article
Language:	English
Published:	2005
Subjects:	Q Science (General)
Online Access:	http://shdl.mmu.edu.my/2170/ http://shdl.mmu.edu.my/2170/1/1492.pdf

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