Sputtering power and deposition pressure effects on the electrical and structural properties of copper thin films
We investigated the effects of sputtering power and deposition pressure on the electrical and structural properties of dc magnetron sputter-deposited copper films on p-type silicon grown at room temperature. Results from our experiments showed that the deposition rate of the copper films increased p...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
2005
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| Subjects: | |
| Online Access: | http://shdl.mmu.edu.my/2170/ http://shdl.mmu.edu.my/2170/1/1492.pdf |