Gas doping ratio effects on p-type hydrogenated nanocrystalline silicon thin films grown by hot-wire chemical vapor deposition

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Gas doping ratio effects on p-type hydrogenated nanocrystalline silicon thin films grown by hot-wire chemical vapor deposition

Hydrogenated nanocrystalline silicon (nc-Si:H) grown by hot-wire chemical vapor deposition (HWCVD) has recently drawn significant attention in the area of thin-film large area optoelectronics due to possibility of high deposition rate. We report on the effects of diborane (B(2)H(6)) doping ratio on...

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Bibliographic Details
Main Authors:	LUO, P, ZHOU, Z, CHAN, K, TANG, D, CUI, R, DOU, X
Format:	Article
Published:	ELSEVIER SCIENCE BV 2008
Subjects:	TP Chemical technology TD Environmental technology. Sanitary engineering
Online Access:	http://shdl.mmu.edu.my/1943/

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