Released micromachined beams utilizing laterally uniform porosity porous silicon
© 2014, Sun et al.; licensee Springer. Abstract: Suspended micromachined porous silicon beams with laterally uniform porosity are reported, which have been fabricated using standard photolithography processes designed for compatibility with complementary metal-oxide-semiconductor (CMOS) processe...
| Main Authors: | , , |
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| Format: | Journal Article |
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Springer New York
2014
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| Online Access: | http://hdl.handle.net/20.500.11937/79814 |
| _version_ | 1848764108961218560 |
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| author | Sun, Xiao Keating, Adrian Parish, Giacinta |
| author_facet | Sun, Xiao Keating, Adrian Parish, Giacinta |
| author_sort | Sun, Xiao |
| building | Curtin Institutional Repository |
| collection | Online Access |
| description | © 2014, Sun et al.; licensee Springer.
Abstract: Suspended micromachined porous silicon beams with laterally uniform porosity are reported, which have been fabricated using standard photolithography processes designed for compatibility with complementary metal-oxide-semiconductor (CMOS) processes. Anodization, annealing, reactive ion etching, repeated photolithography, lift off and electropolishing processes were used to release patterned porous silicon microbeams on a Si substrate. This is the first time that micromachined, suspended PS microbeams have been demonstrated with laterally uniform porosity, well-defined anchors and flat surfaces.
PACS: 81.16.-c; 81.16.Nd; 81.16.Rf |
| first_indexed | 2025-11-14T11:14:07Z |
| format | Journal Article |
| id | curtin-20.500.11937-79814 |
| institution | Curtin University Malaysia |
| institution_category | Local University |
| last_indexed | 2025-11-14T11:14:07Z |
| publishDate | 2014 |
| publisher | Springer New York |
| recordtype | eprints |
| repository_type | Digital Repository |
| spelling | curtin-20.500.11937-798142021-01-08T07:54:28Z Released micromachined beams utilizing laterally uniform porosity porous silicon Sun, Xiao Keating, Adrian Parish, Giacinta © 2014, Sun et al.; licensee Springer. Abstract: Suspended micromachined porous silicon beams with laterally uniform porosity are reported, which have been fabricated using standard photolithography processes designed for compatibility with complementary metal-oxide-semiconductor (CMOS) processes. Anodization, annealing, reactive ion etching, repeated photolithography, lift off and electropolishing processes were used to release patterned porous silicon microbeams on a Si substrate. This is the first time that micromachined, suspended PS microbeams have been demonstrated with laterally uniform porosity, well-defined anchors and flat surfaces. PACS: 81.16.-c; 81.16.Nd; 81.16.Rf 2014 Journal Article http://hdl.handle.net/20.500.11937/79814 10.1186/1556-276X-9-426 http://creativecommons.org/licenses/by/4.0/ Springer New York fulltext |
| spellingShingle | Sun, Xiao Keating, Adrian Parish, Giacinta Released micromachined beams utilizing laterally uniform porosity porous silicon |
| title | Released micromachined beams utilizing laterally uniform porosity porous silicon |
| title_full | Released micromachined beams utilizing laterally uniform porosity porous silicon |
| title_fullStr | Released micromachined beams utilizing laterally uniform porosity porous silicon |
| title_full_unstemmed | Released micromachined beams utilizing laterally uniform porosity porous silicon |
| title_short | Released micromachined beams utilizing laterally uniform porosity porous silicon |
| title_sort | released micromachined beams utilizing laterally uniform porosity porous silicon |
| url | http://hdl.handle.net/20.500.11937/79814 |