APA (7th ed.) Citation

Tucker, M., Ganesan, R., McCulloch, D., Partridge, J., Stueber, M., Ulrich, S., . . . Marks, N. (2016). Mixed-mode high-power impulse magnetron sputter deposition of tetrahedral amorphous carbon with pulse-length control of ionization. American Institute of Physics.

Chicago Style (17th ed.) Citation

Tucker, Mark, R. Ganesan, D. McCulloch, J. Partridge, M. Stueber, S. Ulrich, M. Bilek, D. McKenzie, and Nigel Marks. Mixed-mode High-power Impulse Magnetron Sputter Deposition of Tetrahedral Amorphous Carbon with Pulse-length Control of Ionization. American Institute of Physics, 2016.

MLA (9th ed.) Citation

Tucker, Mark, et al. Mixed-mode High-power Impulse Magnetron Sputter Deposition of Tetrahedral Amorphous Carbon with Pulse-length Control of Ionization. American Institute of Physics, 2016.