Mixed-mode high-power impulse magnetron sputter deposition of tetrahedral amorphous carbon with pulse-length control of ionization

Mixed-mode high-power impulse magnetron sputter deposition of tetrahedral amorphous carbon with pulse-length control of ionization

© 2016 Author(s). High-power impulse magnetron sputtering (HiPIMS) is used to deposit amorphous carbon thin films with sp3 fractions of 13% to 82%. Increasing the pulse length results in a transition from conventional HiPIMS deposition to a "mixed-mode" in which an arc triggers on the targ...

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Bibliographic Details
Main Authors: Tucker, Mark, Ganesan, R., McCulloch, D., Partridge, J., Stueber, M., Ulrich, S., Bilek, M., McKenzie, D., Marks, Nigel
Format: Journal Article
Published: American Institute of Physics 2016
Online Access:http://purl.org/au-research/grants/arc/FT120100924
http://hdl.handle.net/20.500.11937/63459

Internet

http://purl.org/au-research/grants/arc/FT120100924
http://hdl.handle.net/20.500.11937/63459

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