Detection of Amorphous Silica in Air-Oxidized Ti3SiC2 at 500-1000°C

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Detection of Amorphous Silica in Air-Oxidized Ti3SiC2 at 500-1000°C

In this paper we describe the use of secondary-ion mass spectrometry (SIMS) and nuclear magnetic resonance (NMR) to detect the existence of amorphous silica in Ti3SiC2 oxidised at 500-1000°C. The formation of an amorphous SiO2 layer and its growth in thickness with temperature was monitored using dy...

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Bibliographic Details
Main Authors:	Pang, W., Low, It-Meng, Hanna, J.
Format:	Journal Article
Published:	Polskie Towarzystwo Ceramiczne 2010
Subjects:	Ti3SiC2 amorphous silica oxidation SIMS NMR
Online Access:	http://www.ptcer.pl/mccm/en/article-details/62/3/255 http://hdl.handle.net/20.500.11937/59706

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