Detection of Amorphous Silica in Air-Oxidized Ti3SiC2 at 500-1000°C

Detection of Amorphous Silica in Air-Oxidized Ti3SiC2 at 500-1000°C

In this paper we describe the use of secondary-ion mass spectrometry (SIMS) and nuclear magnetic resonance (NMR) to detect the existence of amorphous silica in Ti3SiC2 oxidised at 500-1000°C. The formation of an amorphous SiO2 layer and its growth in thickness with temperature was monitored using dy...

Full description

Bibliographic Details
Main Authors: Pang, W., Low, It-Meng, Hanna, J.
Format: Journal Article
Published: Polskie Towarzystwo Ceramiczne 2010
Subjects:
Ti3SiC2
amorphous silica
oxidation
SIMS
NMR
Online Access:http://www.ptcer.pl/mccm/en/article-details/62/3/255
http://hdl.handle.net/20.500.11937/59706

Internet

http://www.ptcer.pl/mccm/en/article-details/62/3/255
http://hdl.handle.net/20.500.11937/59706

Similar Items