Detection of Amorphous Silica in Air-Oxidized Ti3SiC2 at 500-1000°C
In this paper we describe the use of secondary-ion mass spectrometry (SIMS) and nuclear magnetic resonance (NMR) to detect the existence of amorphous silica in Ti3SiC2 oxidised at 500-1000°C. The formation of an amorphous SiO2 layer and its growth in thickness with temperature was monitored using dy...
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| Format: | Journal Article |
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Polskie Towarzystwo Ceramiczne
2010
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| Online Access: | http://www.ptcer.pl/mccm/en/article-details/62/3/255 http://hdl.handle.net/20.500.11937/59706 |
| _version_ | 1848760548152311808 |
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| author | Pang, W. Low, It-Meng Hanna, J. |
| author_facet | Pang, W. Low, It-Meng Hanna, J. |
| author_sort | Pang, W. |
| building | Curtin Institutional Repository |
| collection | Online Access |
| description | In this paper we describe the use of secondary-ion mass spectrometry (SIMS) and nuclear magnetic resonance (NMR) to detect the existence of amorphous silica in Ti3SiC2 oxidised at 500-1000°C. The formation of an amorphous SiO2 layer and its growth in thickness with temperature was monitored using dynamic SIMS. A duplex structure with an outer layer of TiO2 and an inner mixture layer of SiO2 and TiO2 was observed. Results of NMR verify for the first time the direct evidence of amorphous silica formation during the oxidation of Ti3SiC2 at the temperature range 500-1000°C. |
| first_indexed | 2025-11-14T10:17:31Z |
| format | Journal Article |
| id | curtin-20.500.11937-59706 |
| institution | Curtin University Malaysia |
| institution_category | Local University |
| last_indexed | 2025-11-14T10:17:31Z |
| publishDate | 2010 |
| publisher | Polskie Towarzystwo Ceramiczne |
| recordtype | eprints |
| repository_type | Digital Repository |
| spelling | curtin-20.500.11937-597062022-01-12T07:30:32Z Detection of Amorphous Silica in Air-Oxidized Ti3SiC2 at 500-1000°C Pang, W. Low, It-Meng Hanna, J. Ti3SiC2 amorphous silica oxidation SIMS NMR In this paper we describe the use of secondary-ion mass spectrometry (SIMS) and nuclear magnetic resonance (NMR) to detect the existence of amorphous silica in Ti3SiC2 oxidised at 500-1000°C. The formation of an amorphous SiO2 layer and its growth in thickness with temperature was monitored using dynamic SIMS. A duplex structure with an outer layer of TiO2 and an inner mixture layer of SiO2 and TiO2 was observed. Results of NMR verify for the first time the direct evidence of amorphous silica formation during the oxidation of Ti3SiC2 at the temperature range 500-1000°C. 2010 Journal Article http://hdl.handle.net/20.500.11937/59706 http://www.ptcer.pl/mccm/en/article-details/62/3/255 Polskie Towarzystwo Ceramiczne restricted |
| spellingShingle | Ti3SiC2 amorphous silica oxidation SIMS NMR Pang, W. Low, It-Meng Hanna, J. Detection of Amorphous Silica in Air-Oxidized Ti3SiC2 at 500-1000°C |
| title | Detection of Amorphous Silica in Air-Oxidized Ti3SiC2 at 500-1000°C |
| title_full | Detection of Amorphous Silica in Air-Oxidized Ti3SiC2 at 500-1000°C |
| title_fullStr | Detection of Amorphous Silica in Air-Oxidized Ti3SiC2 at 500-1000°C |
| title_full_unstemmed | Detection of Amorphous Silica in Air-Oxidized Ti3SiC2 at 500-1000°C |
| title_short | Detection of Amorphous Silica in Air-Oxidized Ti3SiC2 at 500-1000°C |
| title_sort | detection of amorphous silica in air-oxidized ti3sic2 at 500-1000°c |
| topic | Ti3SiC2 amorphous silica oxidation SIMS NMR |
| url | http://www.ptcer.pl/mccm/en/article-details/62/3/255 http://hdl.handle.net/20.500.11937/59706 |