Effect of thermal annealing on nanostructure and shape transition in SiC–C nanocomposites

Controllable low-temperature (500 °C) deposition of SiC–C (3–10 vol.%C) composite ceramic films on Si(100) was achieved using a pulsed dc-magnetron puttering system in a mixture of CH4/Ar, followed by annealing in 600–1000 °C. At annealing temperatures of 800 °C or above, the formation of equiaxed...

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Bibliographic Details
Main Authors: Zhu, Y., Zhou, Z., Lu, Chunsheng, Liao, X., Shen, Y.
Format: Journal Article
Published: American Scientific Publishers 2012
Online Access:http://hdl.handle.net/20.500.11937/5740