High-temperature thermal stability of Ti2AlN and Ti4AlN3: A comparative diffraction study

The susceptibility of Ti2AlN and Ti4AlN3 to high-temperature thermal dissociation in a dynamic environment of high-vacuum has been investigated using in situ neutron diffraction. Under high vacuum, these ternary nitrides decomposed above 1400 °C through the sublimation of Al, and possibly Ti, to for...

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Main Authors: Low, It-Meng (Jim), Pang, W., Kennedy, S., Smith, R.
Format: Journal Article
Published: Elsevier Ltd 2011
Subjects:
Online Access:http://hdl.handle.net/20.500.11937/41414
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author Low, It-Meng (Jim)
Pang, W.
Kennedy, S.
Smith, R.
author_facet Low, It-Meng (Jim)
Pang, W.
Kennedy, S.
Smith, R.
author_sort Low, It-Meng (Jim)
building Curtin Institutional Repository
collection Online Access
description The susceptibility of Ti2AlN and Ti4AlN3 to high-temperature thermal dissociation in a dynamic environment of high-vacuum has been investigated using in situ neutron diffraction. Under high vacuum, these ternary nitrides decomposed above 1400 °C through the sublimation of Al, and possibly Ti, to form a surface coating of TiNx (0.5=x=0.75). The kinetics of isothermal phase decomposition were modelled using the Avrami equation and the Avrami exponents (n) of isothermal decomposition of Ti2AlN and Ti4AlN3 were determined to be 0.62 and 0.18, respectively. The characteristics of thermal stability and phase transitions in Ti2AlN and Ti4AlN3 are compared in terms of the rate of decomposition, phase relations and microstructures.
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institution Curtin University Malaysia
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publishDate 2011
publisher Elsevier Ltd
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spelling curtin-20.500.11937-414142017-09-13T16:09:21Z High-temperature thermal stability of Ti2AlN and Ti4AlN3: A comparative diffraction study Low, It-Meng (Jim) Pang, W. Kennedy, S. Smith, R. Neutron diffraction Thermal decomposition Sublimation Ti2AlN Ternary nitride Ti4AlN3 The susceptibility of Ti2AlN and Ti4AlN3 to high-temperature thermal dissociation in a dynamic environment of high-vacuum has been investigated using in situ neutron diffraction. Under high vacuum, these ternary nitrides decomposed above 1400 °C through the sublimation of Al, and possibly Ti, to form a surface coating of TiNx (0.5=x=0.75). The kinetics of isothermal phase decomposition were modelled using the Avrami equation and the Avrami exponents (n) of isothermal decomposition of Ti2AlN and Ti4AlN3 were determined to be 0.62 and 0.18, respectively. The characteristics of thermal stability and phase transitions in Ti2AlN and Ti4AlN3 are compared in terms of the rate of decomposition, phase relations and microstructures. 2011 Journal Article http://hdl.handle.net/20.500.11937/41414 10.1016/j.jeurceramsoc.2010.09.014 Elsevier Ltd restricted
spellingShingle Neutron diffraction
Thermal decomposition
Sublimation
Ti2AlN
Ternary nitride
Ti4AlN3
Low, It-Meng (Jim)
Pang, W.
Kennedy, S.
Smith, R.
High-temperature thermal stability of Ti2AlN and Ti4AlN3: A comparative diffraction study
title High-temperature thermal stability of Ti2AlN and Ti4AlN3: A comparative diffraction study
title_full High-temperature thermal stability of Ti2AlN and Ti4AlN3: A comparative diffraction study
title_fullStr High-temperature thermal stability of Ti2AlN and Ti4AlN3: A comparative diffraction study
title_full_unstemmed High-temperature thermal stability of Ti2AlN and Ti4AlN3: A comparative diffraction study
title_short High-temperature thermal stability of Ti2AlN and Ti4AlN3: A comparative diffraction study
title_sort high-temperature thermal stability of ti2aln and ti4aln3: a comparative diffraction study
topic Neutron diffraction
Thermal decomposition
Sublimation
Ti2AlN
Ternary nitride
Ti4AlN3
url http://hdl.handle.net/20.500.11937/41414