High-temperature thermal stability of Ti2AlN and Ti4AlN3: A comparative diffraction study

High-temperature thermal stability of Ti2AlN and Ti4AlN3: A comparative diffraction study

The susceptibility of Ti2AlN and Ti4AlN3 to high-temperature thermal dissociation in a dynamic environment of high-vacuum has been investigated using in situ neutron diffraction. Under high vacuum, these ternary nitrides decomposed above 1400 °C through the sublimation of Al, and possibly Ti, to for...

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Bibliographic Details
Main Authors: Low, It-Meng (Jim), Pang, W., Kennedy, S., Smith, R.
Format: Journal Article
Published: Elsevier Ltd 2011
Subjects:
Neutron diffraction
Thermal decomposition
Sublimation
Ti2AlN
Ternary nitride
Ti4AlN3
Online Access:http://hdl.handle.net/20.500.11937/41414

Internet

http://hdl.handle.net/20.500.11937/41414

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