Fabrication of Nanopore Array Electrodes by Focused Ion Beam Milling
Single nanopore electrodes and nanopore electrode arrays have been fabricated using a focused ion beam (FIB) method. High aspect ratio pores (150-400-nm diameter and 500-nm depth) were fabricated using direct-write local ion milling of a silicon nitride layer over a buried platinum electrode. This l...
| Main Authors: | , , , , , , |
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| Format: | Journal Article |
| Published: |
American Chemical Society
2007
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| Online Access: | http://hdl.handle.net/20.500.11937/39372 |