Detection of Amorphous Silica in Air-Oxidized Ti3SiC2 at 500–1000°C by NMR and SIMS

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Detection of Amorphous Silica in Air-Oxidized Ti3SiC2 at 500–1000°C by NMR and SIMS

The use of secondary-ion mass spectrometry (SIMS), nuclear magnetic resonance (NMR) and transmission electron microscopy (TEM) to detect the existence of amorphous silica in Ti3SiC2 oxidised at 500–1000°C is described. The formation of an amorphous SiO2 layer and its growth in thickness with tempera...

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Bibliographic Details
Main Authors:	Pang, W, Low, It Meng, Hanna, J.
Format:	Journal Article
Published:	Trans Tech Publications 2010
Online Access:	http://hdl.handle.net/20.500.11937/38454

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