Diffusion pathways of phosphorus atoms on silicon (001)

Using density-functional theory and a combination of growing string and dimer method transition state searches, we investigate the interaction of phosphorus atoms with the silicon (001) surface. We report reaction pathways for three technologically important processes: diffusion of phosphorus adatom...

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Main Authors: Bennett, J. M., Warschkow, O., Marks, Nigel, McKenzie, D. R.
Format: Journal Article
Published: American Physical Society 2009
Online Access:http://hdl.handle.net/20.500.11937/22583
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author Bennett, J. M.
Warschkow, O.
Marks, Nigel
McKenzie, D. R.
author_facet Bennett, J. M.
Warschkow, O.
Marks, Nigel
McKenzie, D. R.
author_sort Bennett, J. M.
building Curtin Institutional Repository
collection Online Access
description Using density-functional theory and a combination of growing string and dimer method transition state searches, we investigate the interaction of phosphorus atoms with the silicon (001) surface. We report reaction pathways for three technologically important processes: diffusion of phosphorus adatoms on the surface, incorporation of the phosphorus adatom into the surface, and diffusion of the incorporated phosphorus atom within the surface. These reactions have direct relevance to nanoscale lithographic schemes capable of positioning single phosphorus atoms on the silicon surface. Temperatures of activation for the various processes are calculated and, where possible, compared with experiment.
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publishDate 2009
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spelling curtin-20.500.11937-225832017-09-13T15:57:06Z Diffusion pathways of phosphorus atoms on silicon (001) Bennett, J. M. Warschkow, O. Marks, Nigel McKenzie, D. R. Using density-functional theory and a combination of growing string and dimer method transition state searches, we investigate the interaction of phosphorus atoms with the silicon (001) surface. We report reaction pathways for three technologically important processes: diffusion of phosphorus adatoms on the surface, incorporation of the phosphorus adatom into the surface, and diffusion of the incorporated phosphorus atom within the surface. These reactions have direct relevance to nanoscale lithographic schemes capable of positioning single phosphorus atoms on the silicon surface. Temperatures of activation for the various processes are calculated and, where possible, compared with experiment. 2009 Journal Article http://hdl.handle.net/20.500.11937/22583 10.1103/PhysRevB.79.165311 American Physical Society fulltext
spellingShingle Bennett, J. M.
Warschkow, O.
Marks, Nigel
McKenzie, D. R.
Diffusion pathways of phosphorus atoms on silicon (001)
title Diffusion pathways of phosphorus atoms on silicon (001)
title_full Diffusion pathways of phosphorus atoms on silicon (001)
title_fullStr Diffusion pathways of phosphorus atoms on silicon (001)
title_full_unstemmed Diffusion pathways of phosphorus atoms on silicon (001)
title_short Diffusion pathways of phosphorus atoms on silicon (001)
title_sort diffusion pathways of phosphorus atoms on silicon (001)
url http://hdl.handle.net/20.500.11937/22583